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Reliability of graphene as charge storage layer in floating gate flash memory

Indonesian Journal of Electical Engineering and Informatics (IJEEI) · Vol. 7 No. 2 (2019) · hlm. 331–337

DOI
10.52549/ijeei.v7i2.1170
ISSN
2089-3272, 2089-3272
Terbit
2019-05-20
Penerbit
IAES Indonesian Section
Bahasa
en

Abstrak

This study aims to investigate the memory performances of graphene as a charge storage layer in the floating gate with difference doping concentration of n-channel and p-channel substrates using Silvaco ATLAS TCAD Tools. The simulation work has been done to determine the performance of flash memory in terms of memory window, P/E characteristics and data retention and have been validated with the experimental work done by other researchers. From the simulation data, the trend of memory window at low P/E voltage is nearly overlapped between simulation and experimental data. The memory window at ±20V P/E voltage for n-channel and p-channel flash memory cell are 15.4V and 15.6V respectively. The data retention for the n-channel flash memory cell is retained by 75% (from 15.4V to 11.6V) whereas for the p-channel flash memory cell is retained by 80% (from 15.6V to 12.5V) after 10 years of extrapolation with -1/1V gate stress which shows that p-channel flash memory cell demonstrates better data retention compared to n-channel flash memory cell.

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  • University of Technology Malaysia
  • Université Rennes 1
  • Tun Hussein Onn University of Malaysia
  • Afiliasi tidak diketahui
  • Organisasi berbeda
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Rekan penulisOrganisasiArtikel bersama
Mohd Fairus Mohd YusoffUniversity of Technology Malaysia3
Mohammed Adamu SuleAfiliasi tidak diketahui3
Myrza AkbariAfiliasi tidak diketahui2
Farid ZubirUniversity of Technology Malaysia2
Yanuar Zulardiansyah AriefUniversity of Technology Malaysia1
Nehaluddin AhmadUniversity of Technology Malaysia1
Izzah Hazirah ZakariaUniversity of Technology Malaysia1
N. A. AwangUniversity of Technology Malaysia1
M. K. A. RahimUniversity of Technology Malaysia1
Huda A. MajidTun Hussein Onn University of Malaysia1
Ronan SauleauUniversité Rennes 11
Johaidah MistarAfiliasi tidak diketahui1
Rahmati IsmailAfiliasi tidak diketahui1
Sukardi PutraAfiliasi tidak diketahui1
Denny Suheri AbdullahAfiliasi tidak diketahui1
Albadi SinulinggaAfiliasi tidak diketahui1
Saini MuliaAfiliasi tidak diketahui1
Nyak AmirAfiliasi tidak diketahui1
Sukiri SukiriAfiliasi tidak diketahui1
Syahruddin SyahruddinAfiliasi tidak diketahui1
Cheng Siong LimUniversity of Technology Malaysia1
Kien Liong WongAfiliasi tidak diketahui1
Wee Khang ChongAfiliasi tidak diketahui1
Mu Wen ChuanAfiliasi tidak diketahui1
Mohd Shahrizal Bin RusliAfiliasi tidak diketahui1
Nurul Ezaila Binti AliasAfiliasi tidak diketahui1
Michael TanAfiliasi tidak diketahui1
Muhammad Akram Mohd SobriAfiliasi tidak diketahui1
Mohammad Kamal A. RahimAfiliasi tidak diketahui1
Muhammad Naeem IqbalAfiliasi tidak diketahui1
Mohamad Rijal HamidAfiliasi tidak diketahui1
Huda Bin A MajidAfiliasi tidak diketahui1

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Sumber metadata: OAI-PMH (metadata jurnal) http://section.iaesonline.com/index.php/IJEEI/oai, pertama di-harvest 8 Nov 2026, terakhir terlihat 8 Nov 2026.
Metadata asli (oai_dc)
<oai_dc:dc xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/  http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
	<dc:title xml:lang="en">Reliability of graphene as charge storage layer in floating gate flash memory</dc:title>
	<dc:creator xml:lang="en">Ahmad, M. Hilman</dc:creator>
	<dc:creator xml:lang="en">Alias, N Ezaila</dc:creator>
	<dc:creator xml:lang="en">Hamzah, Afiq</dc:creator>
	<dc:creator xml:lang="en">Johari, Zaharah</dc:creator>
	<dc:creator xml:lang="en">Abidin, M. S. Z.</dc:creator>
	<dc:creator xml:lang="en">Paraman, Norlina</dc:creator>
	<dc:creator xml:lang="en">Tan, M. L. Peng</dc:creator>
	<dc:creator xml:lang="en">Ismail, Razali</dc:creator>
	<dc:subject xml:lang="en">Charge storage layer</dc:subject>
	<dc:subject xml:lang="en">Data retention</dc:subject>
	<dc:subject xml:lang="en">Flash memory</dc:subject>
	<dc:subject xml:lang="en">Graphene</dc:subject>
	<dc:subject xml:lang="en">Memory window</dc:subject>
	<dc:description xml:lang="en">This study aims to investigate the memory performances of graphene as a charge storage layer in the floating gate with difference doping concentration of n-channel and p-channel substrates using Silvaco ATLAS TCAD Tools. The simulation work has been done to determine the performance of flash memory in terms of memory window, P/E characteristics and data retention and have been validated with the experimental work done by other researchers. From the simulation data, the trend of memory window at low P/E voltage is nearly overlapped between simulation and experimental data. The memory window at ±20V P/E voltage for n-channel and p-channel flash memory cell are 15.4V and 15.6V respectively. The data retention for the n-channel flash memory cell is retained by 75% (from 15.4V to 11.6V) whereas for the p-channel flash memory cell is retained by 80% (from 15.6V to 12.5V) after 10 years of extrapolation with -1/1V gate stress which shows that p-channel flash memory cell demonstrates better data retention compared to n-channel flash memory cell.</dc:description>
	<dc:publisher xml:lang="en">IAES Indonesian Section</dc:publisher>
	<dc:date>2019-05-20</dc:date>
	<dc:type>info:eu-repo/semantics/article</dc:type>
	<dc:type>info:eu-repo/semantics/publishedVersion</dc:type>
	<dc:format>application/pdf</dc:format>
	<dc:identifier>https://section.iaesonline.com/index.php/IJEEI/article/view/1170</dc:identifier>
	<dc:identifier>10.52549/ijeei.v7i2.1170</dc:identifier>
	<dc:source xml:lang="en">Indonesian Journal of Electrical Engineering and Informatics (IJEEI); Vol. 7 No. 2: June 2019; 331-337</dc:source>
	<dc:source>2089-3272</dc:source>
	<dc:source>2089-3272</dc:source>
	<dc:language>en</dc:language>
	<dc:relation>https://section.iaesonline.com/index.php/IJEEI/article/view/1170/434</dc:relation>
</oai_dc:dc>