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Catalytic Carbon Submicron Fabrication Using Home- Built Very-High Frequency Plasma Enhanced Chemical Vapour Deposition

Journal of Mathematical and Fundamental Sciences · Vol. 40 No. 2 (2013) · hlm. 166–181

DOI
10.5614/itbj.sci.2008.40.2.6
ISSN
2338-5510, 2337-5760
Terbit
2013-07-21
Penerbit
Directorate for Research and Innovation (DRI) ITB
Bahasa
eng

Abstrak

In this research, carbon nanotubes (CNT) fabrication has been tried by using an existing home-made Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The fabrication is a catalytic growth process, whereby a Fecatalyst thin film is grown on the Silicon substrate by using dc-Unbalanced Magnetron Sputtering. Methane (CH4) as carbon source and diluted silane (SiH4) in hydrogen as hydrogen source (ratio 10:1) was used for the CNT fabrication with the Very High Frequency PECVD (VHF-PECVD) method. The fabrication process was executed at the relatively low temperature of 250oC, but with the higher operating plasma frequency of 70 MHz. Recently, a fabrication process with only a single gas source has been carried out as well, but using a modified VHF-PECVD system with an additional hot-wirecomponent. The attempt was done at an higher growth temperature of 400oC. Morphological characterizations, by using Scanning Electron Micrograph (SEM) and Scanning Probe Microscopy (SPM), and composition characterization, by using Energy Dispersion Analysis by X-Ray (EDAX), show convincing results that there are some signatures of CNT present.

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  • Universitas Halu Oleo
  • Universitas Syiah Kuala
  • Bandung Institute of Technology
  • Indonesia University of Education
  • Universitas Gadjah Mada
  • Universitas Muhammadiyah Sumatera Barat
  • Tohoku University
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Rekan penulisOrganisasiArtikel bersama
Mukhsar MukhsarUniversitas Halu Oleo4
Toto WinataBandung Institute of Technology4
Baharuddin BaharuddinHasanuddin University3
Asrul SaniUniversitas Halu Oleo3
Bahriddin AbapihiUniversitas Halu Oleo2
Irma Rahma SuwarmaIndonesia University of Education2
Desminar DesminarUniversitas Muhammadiyah Sumatera Barat2
Syaflin HalimUniversitas Muhammadiyah Sumatera Barat2
Winny LiliawatiIndonesia University of Education2
Rinaldi IdroesUniversitas Syiah Kuala2
Zulkarnain JalilUniversitas Syiah Kuala2
Malahayati MalahayatiUniversitas Syiah Kuala2
Ismail IsmailUniversitas Syiah Kuala2
Sawaludin SawaludinUniversitas Halu Oleo1
Sani FitrianiUniversitas Halu Oleo1
Noor Husna KhairisaUniversitas Halu Oleo1
Nur AlfianiUniversitas Halu Oleo1
Loade Muh. Iradat SalihinUniversitas Halu Oleo1
Nurgiantoro NurgiantoroAfiliasi tidak diketahui1
Muhamad AzharuddinUniversitas Halu Oleo1
Andi TenriawaruUniversitas Halu Oleo1
Ruslan RuslanUniversitas Halu Oleo1
Rahmalia SahupalaUniversitas Halu Oleo1
Hanindyo Adi PrabowoUniversitas Gadjah Mada1
Andriwibowo AndriwibowoUniversity of Indonesia1
Cornelius Devito AtmajaUniversitas Gadjah Mada1
Hari Eko PurwantoUniversitas Gadjah Mada1
Ruslan MajidUniversitas Halu Oleo1
Fahmiati FahmiatiUniversitas Halu Oleo1
Muzuni MuzuniUniversitas Halu Oleo1
La GubuUniversitas Halu Oleo1
I Putu SudayasaAfiliasi tidak diketahui1
Febrina Aspyan TariIndonesia University of Education1

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Sumber metadata: OAI-PMH (metadata jurnal) https://journals.itb.ac.id/index.php/jmfs/oai, pertama di-harvest 9 Nov 2026, terakhir terlihat 9 Nov 2026.
Metadata asli (oai_dc) 
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	<dc:title xml:lang="en-US">Catalytic Carbon Submicron Fabrication Using Home- Built Very-High Frequency Plasma Enhanced Chemical Vapour Deposition</dc:title>
	<dc:creator>Sukirno, Sukirno</dc:creator>
	<dc:creator>Bisri, Satria Zulkarnaen</dc:creator>
	<dc:creator>Sari, Rasih Yulia</dc:creator>
	<dc:creator>Hasanah, Lilik</dc:creator>
	<dc:creator>Mursal, Mursal</dc:creator>
	<dc:creator>Usman, Ida</dc:creator>
	<dc:creator>Darsikin, Darsikin</dc:creator>
	<dc:description xml:lang="en-US">In this research, carbon nanotubes (CNT) fabrication has been tried by using an existing home-made Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The fabrication is a catalytic growth process, whereby a Fecatalyst thin film is grown on the Silicon substrate by using dc-Unbalanced Magnetron Sputtering. Methane (CH4) as carbon source and diluted silane (SiH4) in hydrogen as hydrogen source (ratio 10:1) was used for the CNT fabrication with the Very High Frequency PECVD (VHF-PECVD) method. The fabrication process was executed at the relatively low temperature of 250oC, but with the higher operating plasma frequency of 70 MHz. Recently, a fabrication process with only a single gas source has been carried out as well, but using a modified VHF-PECVD system with an additional hot-wirecomponent. The attempt was done at an higher growth temperature of 400oC. Morphological characterizations, by using Scanning Electron Micrograph (SEM) and Scanning Probe Microscopy (SPM), and composition characterization, by using Energy Dispersion Analysis by X-Ray (EDAX), show convincing results that there are some signatures of CNT present.</dc:description>
	<dc:publisher xml:lang="en-US">Directorate for Research and Innovation (DRI) ITB</dc:publisher>
	<dc:date>2013-07-21</dc:date>
	<dc:type>info:eu-repo/semantics/article</dc:type>
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	<dc:format>application/pdf</dc:format>
	<dc:identifier>https://journals.itb.ac.id/index.php/jmfs/article/view/41</dc:identifier>
	<dc:identifier>10.5614/itbj.sci.2008.40.2.6</dc:identifier>
	<dc:source xml:lang="en-US">Journal of Mathematical and Fundamental Sciences; Vol. 40 No. 2 (2008); 166-181</dc:source>
	<dc:source>2338-5510</dc:source>
	<dc:source>2337-5760</dc:source>
	<dc:language>eng</dc:language>
	<dc:relation>https://journals.itb.ac.id/index.php/jmfs/article/view/41/37</dc:relation>
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