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Numerical analysis in Ar-H 2 coupled-coil inductively coupled thermal plasma with Si feedstock for stable operation

International Journal of Electrical and Computer Engineering (IJECE) · Vol. 13 No. 4 (2023)

DOI
10.11591/ijece.v13i4.pp3695-3705
ISSN
2722-2578, 2088-8708
Published
2023-08-01
Publisher
Institute of Advanced Engineering and Science
License
creativecommons.org/licenses/by-sa/4.0

Abstract

In nanopowder synthesis, the starting powder to be evaporated is infused in a plasma torch through the upper coil and the lower coil in the coupled model of inductively coupled thermal plasma (coupled-coil inductively coupled thermal plasma (ICTP)). Mixing these evaporated materials to form the coupled ICTP significantly influences the thermodynamic and transport properties. It is essential to understand these complex interactions between coupled ICTP and feedstock evaporation. This research investigated the thermal interactions between silicon raw material powder (Si) with ICTP in coupled 99%Ar/1%H 2 through the numerical model developed for the synthesis of Si nanopowder. The feed rate of the Si raw material was set at 0.05, 0.1, and 0.5 g/min. This implies that the increased Si feed is too heavy to vaporize all the injected feed.

Collaboration network of the authors

14 authors · 31 co-authorship links · 14 across different organisations

Hover or tap a name to highlight its co-authors. Double-click to open the author's page.

  • Universitas Sumatera Utara
  • Kanazawa University
  • Universiti Teknologi MARA
  • University of Technology Malaysia
  • Yangon Technological University
  • Different organisations
  • Same organisation
  • Affiliation unknown
  • Thicker line = more joint articles · bigger circle = more articles
Show as table
Co-authorOrganisationJoint articles
Nur Nabila MohamedUniversiti Teknologi MARA3
Naemah MubarakahUniversitas Sumatera Utara2
Soeharwinto SoeharwintoUniversitas Sumatera Utara2
Timothy Juan Hartanto LumbanrajaUniversitas Sumatera Utara1
Yanuar Zulardiansyah AriefUniversity of Technology Malaysia1
Maulaya MuhammadUniversitas Sumatera Utara1
Riswan DinziUniversitas Sumatera Utara1
Mai Kai Suan TialYangon Technological University1
Azrial Aziz Azhari NasutionUniversitas Sumatera Utara1
Farel SitumeangUniversitas Sumatera Utara1
Syahrun MubarokUniversitas Sumatera Utara1
Naomi AzhariUniversitas Sumatera Utara1

Affiliations come from OpenAlex; journal OAI-PMH metadata carries none. Authors without an OpenAlex ID are matched by name, which can merge or split people.

This record comes from Crossref (what the publisher deposited), because the journal's own OAI-PMH endpoint could not be harvested.

Metadata source: Crossref API (cadangan, berdasarkan ISSN) https://api.crossref.org/journals/2088-8708/works, first harvested 27 Okt 2026, last seen 27 Okt 2026.
Metadata as oai_dc, converted from Crossref
<oai_dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/"><dc:title>Numerical analysis in Ar-H&amp;lt;sub&amp;gt;2&amp;lt;/sub&amp;gt; coupled-coil inductively coupled thermal plasma with Si feedstock for stable operation</dc:title><dc:creator>Siregar, Yulianta</dc:creator><dc:creator>Tanaka, Yasunori</dc:creator><dc:description>&lt;jats:p&gt;&amp;lt;span lang="EN-US"&amp;gt;In nanopowder synthesis, the starting powder to be evaporated is infused in a plasma torch through the upper coil and the lower coil in the coupled model of inductively coupled thermal plasma (coupled-coil inductively coupled thermal plasma (ICTP)). Mixing these evaporated materials to form the coupled ICTP significantly influences the thermodynamic and transport properties. It is essential to understand these complex interactions between coupled ICTP and feedstock evaporation. This research investigated the thermal interactions between silicon raw material powder (Si) with ICTP in coupled 99%Ar/1%H&amp;lt;sub&amp;gt;2&amp;lt;/sub&amp;gt; through the numerical model developed for the synthesis of Si nanopowder. The feed rate of the Si raw material was set at 0.05, 0.1, and 0.5 g/min. This implies that the increased Si feed is too heavy to vaporize all the injected feed.&amp;lt;/span&amp;gt;&lt;/jats:p&gt;</dc:description><dc:publisher>Institute of Advanced Engineering and Science</dc:publisher><dc:date>2023-08-01</dc:date><dc:type>info:eu-repo/semantics/article</dc:type><dc:format>application/pdf</dc:format><dc:identifier>https://doi.org/10.11591/ijece.v13i4.pp3695-3705</dc:identifier><dc:identifier>10.11591/ijece.v13i4.pp3695-3705</dc:identifier><dc:source>International Journal of Electrical and Computer Engineering (IJECE); Vol 13 No 4 (2023); 3695</dc:source><dc:source>2722-2578</dc:source><dc:source>2088-8708</dc:source><dc:relation>https://ijece.iaescore.com/index.php/IJECE/article/viewFile/30180/16765</dc:relation><dc:rights>http://creativecommons.org/licenses/by-sa/4.0</dc:rights></oai_dc:dc>