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Catalytic Carbon Submicron Fabrication Using Home- Built Very-High Frequency Plasma Enhanced Chemical Vapour Deposition

Journal of Mathematical and Fundamental Sciences · Vol. 40 No. 2 (2013) · pp. 166–181

DOI
10.5614/itbj.sci.2008.40.2.6
ISSN
2338-5510, 2337-5760
Published
2013-07-21
Publisher
Directorate for Research and Innovation (DRI) ITB
Language
eng

Abstract

In this research, carbon nanotubes (CNT) fabrication has been tried by using an existing home-made Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The fabrication is a catalytic growth process, whereby a Fecatalyst thin film is grown on the Silicon substrate by using dc-Unbalanced Magnetron Sputtering. Methane (CH4) as carbon source and diluted silane (SiH4) in hydrogen as hydrogen source (ratio 10:1) was used for the CNT fabrication with the Very High Frequency PECVD (VHF-PECVD) method. The fabrication process was executed at the relatively low temperature of 250oC, but with the higher operating plasma frequency of 70 MHz. Recently, a fabrication process with only a single gas source has been carried out as well, but using a modified VHF-PECVD system with an additional hot-wirecomponent. The attempt was done at an higher growth temperature of 400oC. Morphological characterizations, by using Scanning Electron Micrograph (SEM) and Scanning Probe Microscopy (SPM), and composition characterization, by using Energy Dispersion Analysis by X-Ray (EDAX), show convincing results that there are some signatures of CNT present.

Collaboration network of the authors

40 authors · 96 co-authorship links · showing the 40 most connected

Hover or tap a name to highlight its co-authors. Double-click to open the author's page.

  • Universitas Halu Oleo
  • Indonesia University of Education
  • Universitas Gadjah Mada
  • Politeknik Negeri Sriwijaya
  • Affiliation unknown
  • Different organisations
  • Same organisation
  • Affiliation unknown
  • Thicker line = more joint articles · bigger circle = more articles
Show as table
Co-authorOrganisationJoint articles
Winny LiliawatiIndonesia University of Education3
Hanindyo AdiAffiliation unknown3
Zulkarnain JalilAffiliation unknown3
Siti SumarmiAffiliation unknown3
Muhammad AnasUniversitas Halu Oleo2
Anita IndriasaryAffiliation unknown2
Iradat SalihinAffiliation unknown2
Achmad SamsudinIndonesia University of Education2
Irma Rahma SuwarmaIndonesia University of Education2
Desminar DesminarAffiliation unknown2
Syaflin HalimAffiliation unknown2
Suwarno HadisusantoUniversitas Gadjah Mada2
Abdulrahman Saad AldawoodAffiliation unknown2
Rinaldi IdroesAffiliation unknown2
Malahayati MalahayatiPoliteknik Negeri Sriwijaya2
Laurentius Hartanto NugrohoAffiliation unknown2
Hari PurwantoAffiliation unknown2
R.C. Hidayat SoesilohadiAffiliation unknown2
Made KusumayasaAffiliation unknown1
Purwo Adi SetyoAffiliation unknown1
Waode Sukmawati ArsyadAffiliation unknown1
Wa Ode Sukmawati ArsyadAffiliation unknown1
Dicky Berthus ChristoAffiliation unknown1
Desy SusilowatiAffiliation unknown1
Deki ZulkarnainUniversitas Halu Oleo1
Achmad Selamet AkuUniversitas Halu Oleo1
La Ode SahabaUniversitas Halu Oleo1
Yamin YaddiAffiliation unknown1
La Ode Muh. MunadiAffiliation unknown1
Restu LibrianiAffiliation unknown1
Fitrianingsih FitrianingsihAffiliation unknown1
La Ode KadidaeUniversitas Halu Oleo1
Waode Sukmawati ArsyadAffiliation unknown1

Affiliations come from OpenAlex; journal OAI-PMH metadata carries none. Authors without an OpenAlex ID are matched by name, which can merge or split people.

Metadata source: OAI-PMH (metadata jurnal) https://journals.itb.ac.id/index.php/jmfs/oai, first harvested 9 Nov 2026, last seen 9 Nov 2026.
Original metadata (oai_dc) 
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	<dc:title xml:lang="en-US">Catalytic Carbon Submicron Fabrication Using Home- Built Very-High Frequency Plasma Enhanced Chemical Vapour Deposition</dc:title>
	<dc:creator>Sukirno, Sukirno</dc:creator>
	<dc:creator>Bisri, Satria Zulkarnaen</dc:creator>
	<dc:creator>Sari, Rasih Yulia</dc:creator>
	<dc:creator>Hasanah, Lilik</dc:creator>
	<dc:creator>Mursal, Mursal</dc:creator>
	<dc:creator>Usman, Ida</dc:creator>
	<dc:creator>Darsikin, Darsikin</dc:creator>
	<dc:description xml:lang="en-US">In this research, carbon nanotubes (CNT) fabrication has been tried by using an existing home-made Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The fabrication is a catalytic growth process, whereby a Fecatalyst thin film is grown on the Silicon substrate by using dc-Unbalanced Magnetron Sputtering. Methane (CH4) as carbon source and diluted silane (SiH4) in hydrogen as hydrogen source (ratio 10:1) was used for the CNT fabrication with the Very High Frequency PECVD (VHF-PECVD) method. The fabrication process was executed at the relatively low temperature of 250oC, but with the higher operating plasma frequency of 70 MHz. Recently, a fabrication process with only a single gas source has been carried out as well, but using a modified VHF-PECVD system with an additional hot-wirecomponent. The attempt was done at an higher growth temperature of 400oC. Morphological characterizations, by using Scanning Electron Micrograph (SEM) and Scanning Probe Microscopy (SPM), and composition characterization, by using Energy Dispersion Analysis by X-Ray (EDAX), show convincing results that there are some signatures of CNT present.</dc:description>
	<dc:publisher xml:lang="en-US">Directorate for Research and Innovation (DRI) ITB</dc:publisher>
	<dc:date>2013-07-21</dc:date>
	<dc:type>info:eu-repo/semantics/article</dc:type>
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	<dc:identifier>https://journals.itb.ac.id/index.php/jmfs/article/view/41</dc:identifier>
	<dc:identifier>10.5614/itbj.sci.2008.40.2.6</dc:identifier>
	<dc:source xml:lang="en-US">Journal of Mathematical and Fundamental Sciences; Vol. 40 No. 2 (2008); 166-181</dc:source>
	<dc:source>2338-5510</dc:source>
	<dc:source>2337-5760</dc:source>
	<dc:language>eng</dc:language>
	<dc:relation>https://journals.itb.ac.id/index.php/jmfs/article/view/41/37</dc:relation>
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