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Simulation and Fabrication of Double Barrier Structure of P-I-N Amorphous Silicon (a-Si) Device

Journal of Mathematical and Fundamental Sciences · Vol. 33 No. 1 (2019) · hlm. 13–16

ISSN
2338-5510, 2337-5760
Terbit
2019-01-18
Penerbit
Directorate for Research and Innovation (DRI) ITB
Bahasa
eng

Abstrak

Abstract. The application of double barrier (DB) structure in p-i-n amorphous silicon (a-Si) device was studied. The theoretical study was done to obtain device parameters such as tunneling probability and current density. The tunneling probability was calculated by employing the Schroedinger equation, WKB approximation and Green function. Width of potential well, width and height of barrier were varied to obtain the highest tunneling probability value. The current density was contributed by diffusion, and tunneling current densities. It was found that current density had a peak of 3950 A/m2 at 0.56 volt forward bias. Furthermore, the fabrication of p-i-n a-Si device with double barrier structure was successfully carried out. To realize the double barrier structure, optimization of optical band gap of barrier a-SiC:H was done by varying ratio of CH4 to [CH4+SiH4]. The fabrication of p-i-n a-Si device was then done by using Plasma Enhanced Chemical Vapor Deposition (PECVD) technique with a structure of glass substrate/TCO/p-a-Si:H (2.15 eV;140Ã…)/i-a-Si:H (1.81 eV;1800 Ã…)/barrier a-SiC:H (2.36 eV;45 Ã…)/potential well i-a-Si:H (1/81 eV; 30 Ã…)/barrier a-SiC:H (2.36 eV; 45 Ã…)/n-a-Si:H (1.81 eV;180 Ã…)/Al. The I-V characteristic of the device showed a peak current calue at 0.55 forward bias. Simulasi dan Fabrikasi Struktur Double Barrier pada Divais Amorphous SiliconSari. Aplikasi struktur double barrier (DB) pada divais amorphous silicon (a-Si) telah dilakukan untuk memperoleh beberapa parameter divais seperti probabilitas tunneling dan rapat arus. Probabilitas tunneling dihitung dengan menerapkan persamaan Schroedinger, pendekatan WKB dan fungsi Green. Lebar sumur potensial, lebar dan tinggi barrier telah divariasikan untuk memperoleh harga probabilitas tunneling yang maksimum. Rapat arus total dari divais dalam perhitungan ini merupakan jumlah dari rapat arus difusi dan rapat arus tunneling. Diperoleh bahwa rapat arus total memiliki nilai maksimum sebesar 3950 A/m2 pada tegangan bias maju 0,56 volt. Selanjutnya, telah berhasil juga difabrikasi divais p-i-n a-Si dengan struktur double barrier. Didapatkan bahwa karakteristik I-V dari divais menunjukkan adanya puncak rapat arus pada tegangan bias maju 0,55 volt.ihamidah@eudoramail.com

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  • Indonesia University of Education
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  • University of Technology Malaysia
  • University of Bengkulu
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  • Tunghai University
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Rekan penulisOrganisasiArtikel bersama
Achmad SamsudinIndonesia University of Education5
Agus SetiawanIndonesia University of Education2
WahyudiAfiliasi tidak diketahui1
Yusri KaminUniversity of Technology Malaysia1
Eka MurdaniIndonesia University of Education1
M. MuslimIndonesia University of Education1
B. CostuYıldız Technical University1
Henny JohanUniversity of Bengkulu1
S. SipriyadiIPB University1
Ana Ratna WulanIndonesia University of Education1
Asmida HerawatiTunghai University1
F.C. WibowoAfiliasi tidak diketahui1
Mohd Zaidi Bin AmiruddinIndonesia University of Education1
Nila ApriliyantiAfiliasi tidak diketahui1
Bayram ÇoştuYıldız Technical University1
Firmanul Catur WibowoAfiliasi tidak diketahui1
Fian Rifqi IrsalinaIndonesia University of Education1
Riski AmeliaIndonesia University of Education1
Riandi RiandiIndonesia University of Education1
Meili YantiIndonesia University of Education1
Parlindungan SinagaIndonesia University of Education1
Wahyuni HandayaniIndonesia University of Education1
Wawan SetiawanIndonesia University of Education1
Eka Cahya PrimaIndonesia University of Education1
Riski MuliyaniInstitut Sains dan Bisnis Internasional Singkawang1
Muslim MuslimIndonesia University of Education1
Dendy Mohammad FauziIndonesia University of Education1
Nuzulira Janeusse FratiwiIndonesia University of Education1
Hasan Ozgur KapiciAfiliasi tidak diketahui1
Endi SuhendiUniversitas Islam Nusantara1
Rizal AdimayudaIndonesia University of Education1
Agus SetiawanIndonesia University of Education1

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Sumber metadata: OAI-PMH (metadata jurnal) https://journals.itb.ac.id/index.php/jmfs/oai, pertama di-harvest 9 Nov 2026, terakhir terlihat 9 Nov 2026.
Metadata asli (oai_dc)
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	<dc:title xml:lang="en-US">Simulation and Fabrication of Double Barrier Structure of P-I-N Amorphous Silicon (a-Si) Device</dc:title>
	<dc:creator>Hamidah, Ida</dc:creator>
	<dc:creator>Kardiawarman, Kardiawarman</dc:creator>
	<dc:creator>Mulyanti, Budi</dc:creator>
	<dc:creator>Suhandi, Andi</dc:creator>
	<dc:subject xml:lang="en-US">amorphous silicon</dc:subject>
	<dc:subject xml:lang="en-US">double barrier</dc:subject>
	<dc:subject xml:lang="en-US">tunneling probability</dc:subject>
	<dc:subject xml:lang="en-US">current density</dc:subject>
	<dc:subject xml:lang="en-US">probabilitas tunneling</dc:subject>
	<dc:subject xml:lang="en-US">rapat arus</dc:subject>
	<dc:description xml:lang="en-US">Abstract. The application of double barrier (DB) structure in p-i-n amorphous silicon (a-Si) device was studied. The theoretical study was done to obtain device parameters such as tunneling probability and current density. The tunneling probability was calculated by employing the Schroedinger equation, WKB approximation and Green function. Width of potential well, width and height of barrier were varied to obtain the highest tunneling probability value. The current density was contributed by diffusion, and tunneling current densities. It was found that current density had a peak of 3950 A/m2 at 0.56 volt forward bias. Furthermore, the fabrication of p-i-n a-Si device with double barrier structure was successfully carried out. To realize the double barrier structure, optimization of optical band gap of barrier a-SiC:H was done by varying ratio of CH4 to [CH4+SiH4]. The fabrication of p-i-n a-Si device was then done by using Plasma Enhanced Chemical Vapor Deposition (PECVD) technique with a structure of glass substrate/TCO/p-a-Si:H (2.15 eV;140Ã…)/i-a-Si:H (1.81 eV;1800 Ã…)/barrier a-SiC:H (2.36 eV;45 Ã…)/potential well i-a-Si:H (1/81 eV; 30 Ã…)/barrier a-SiC:H (2.36 eV; 45 Ã…)/n-a-Si:H (1.81 eV;180 Ã…)/Al. The I-V characteristic of the device showed a peak current calue at 0.55 forward bias. Simulasi dan Fabrikasi Struktur Double Barrier pada Divais Amorphous SiliconSari. Aplikasi struktur double barrier (DB) pada divais amorphous silicon (a-Si) telah dilakukan untuk memperoleh beberapa parameter divais seperti probabilitas tunneling dan rapat arus. Probabilitas tunneling dihitung dengan menerapkan persamaan Schroedinger, pendekatan WKB dan fungsi Green. Lebar sumur potensial, lebar dan tinggi barrier telah divariasikan untuk memperoleh harga probabilitas tunneling yang maksimum. Rapat arus total dari divais dalam perhitungan ini merupakan jumlah dari rapat arus difusi dan rapat arus tunneling. Diperoleh bahwa rapat arus total memiliki nilai maksimum sebesar 3950 A/m2 pada tegangan bias maju 0,56 volt. Selanjutnya, telah berhasil juga difabrikasi divais p-i-n a-Si dengan struktur double barrier. Didapatkan bahwa karakteristik I-V dari divais menunjukkan adanya puncak rapat arus pada tegangan bias maju 0,55 volt.ihamidah@eudoramail.com</dc:description>
	<dc:publisher xml:lang="en-US">Directorate for Research and Innovation (DRI) ITB</dc:publisher>
	<dc:date>2019-01-18</dc:date>
	<dc:type>info:eu-repo/semantics/article</dc:type>
	<dc:type>info:eu-repo/semantics/publishedVersion</dc:type>
	<dc:format>application/pdf</dc:format>
	<dc:identifier>https://journals.itb.ac.id/index.php/jmfs/article/view/9232</dc:identifier>
	<dc:source xml:lang="en-US">Journal of Mathematical and Fundamental Sciences; Vol. 33 No. 1 (2001); 13-16</dc:source>
	<dc:source>2338-5510</dc:source>
	<dc:source>2337-5760</dc:source>
	<dc:language>eng</dc:language>
	<dc:relation>https://journals.itb.ac.id/index.php/jmfs/article/view/9232/3490</dc:relation>
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